First Principles Investigation of Structural and Electronic Properties of AlN/GaN Superlattices Growth Along Various Crystallographic Axes

Authors

Mimouna Oukli
Applied Materials Laboratory (A.M.L), Faculté de Genie Electrique, University Djillali Liabes of Sidi Bel Abbes, 2200 Sidi Bel Abbes Algeria
Noureddine Mehnane
Applied Materials Laboratory (A.M.L), Faculté de Genie Electrique, University Djillali Liabes of Sidi Bel Abbes, 2200 Sidi Bel Abbes Algeria
Hafida Belghoul
Applied Materials Laboratory (A.M.L), Faculté de Genie Electrique, University Djillali Liabes of Sidi Bel Abbes, 2200 Sidi Bel Abbes Algeria

Synopsis

The group III-nitrides semiconductors, InN, GaN and AlN and their alloys are of continuing great interest due to their vast technical application as design of Laser Diodes and Light- Emitting Diodes (LED's) operating in the short-wavelength from blue–green [1-5], ranging from 0.667 to 4.904 eV. The AlN and GaN lattice parameters are approaching each other, and significantly smaller than that of InN [6], the challenge of the lattice mismatch between the epitaxial layers and substrates can be solved by introduced a small amount of InN [7].

ICCAP2021
Published
March 8, 2022