Effect of Annealing Time on Electrodeposited ZnS Thin Films

Authors

Amria Bencherif
Department de Physique, Université de Boumerdes, Algérie
Ahmed Baari
Laboratoire des Sciences et Informatique des Matériaux, Université de Djelfa, Algérie
Essaid Bousbiat
LSIC, ENS Kouba, Alger, Algérie
Abdelyamine Naitbouda
Centre de Développement des Technologies Avancées, Baba Hassen
Assia Bouraiou
Laboratoire des Sciences et Informatique des Matériaux, Université de Djelfa, Algérie

Synopsis

ZnS is a direct band gap semiconductor with a wide band gap (3.68-3.80 eV)1. It is generally observed in two phases: cubic or zinc blende and hexagonal or Würtzite. The cubic phase is the most stable at low temperatures and low pressure1. Due to its physical properties, high chemical stability to processing and photoelectric properties, ZnS is well suited for various applications such as catalysts, gas sensors and photovoltaic applications. Today, ZnS is one of the materials considered as an alternative for buffer layers in solar cells. Compared to CdS, ZnS is a non-toxic and an environment friendly material2. In the present work, we will elaborate series of ZnS samples, using electrodeposition method to study the effect of the annealing time on their structural and optical properties.

ICCAP2021
Published
March 8, 2022