Diversified Methodologies to Prepare Metal Oxide Thin Film for Super Capacitor Applications – A Review


A.A. Deshmane
School of Chemical Science, P.A.H Solapur University, Solapur
R. B. Bhosale
School of Chemical Sciences, P.A.H. Solapur University, Solapur
D. J. Salunkhe
Laxmibai Bhaurao Patil Mahila Mahavidyalaya, Solapur


In this review, we focused on various deposition methods. Viewing to the literature, the metal oxides have been synthesized by many chemical and thermal treatments, including, chemical oxidation, reduction, chemical vapor deposition, calcinations, annealing, plus laser deposition, and arc discharge, chemical bath deposition etc.1-4. Thin film technology is applicable to various materials, like polymers or metals. Common substrate materials are silicon, steel. The deposition materials and the technology, properties of the substrate material could be enhanced for Specific applications by using Chemical Bath Deposition (CBD). In addition to this, recently thin film technology is applicable for plane objects. In broad view thin film has the number of applications like corrosion preventive, decorative coating, photo detector, image processing, optical memories and mainly storage of energy. With these basic ideas, thin-film is the very easiest accurate, sensitive method for deposition purposes. Apart from this technique, there are various methods for deposition. An innovative way of advancement of thin-film acceptable. Thin-film has more advantages in device preparation from electrochemical characterization. Electrochemical supercapacitor is unique electrochemical devices with high power density, high charge-discharge cycle life with high energy efficiency.

December 14, 2021
Online ISSN